Frank Schmidt

City:

Jena

Country:

Germany

Published Applications:

Last publication date:

2007-06-07

Top Assignees for applications by Frank Schmidt

The entities that hold a legal rights for patent applications filed by inventor Schmidt Frank:

Frank Schmidt from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Mask blank and photomask having antireflective properties

Attenuated phase shift mask blank and photomask

Method of producing a mask blank for photolithographic applications, and mask blank

Method for manufacturing of a mask blank for EUV photolithography and mask blank

Mask blank having a protection layer

Ultra high transmission phase shift mask blanks

Attenuating phase shift mask blank and photomask

InventorID:

4387435 ⎘