Markus Renno

City:

Meiningen

Country:

Germany

Published Applications:

Last publication date:

2009-04-14

Top Assignees for applications by Markus Renno

The entities that hold a legal rights for patent applications filed by inventor Renno Markus:

Markus Renno from Meiningen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Mask blank for use in EUV lithography and method for its production

Mask blank and photomask having antireflective properties

Attenuated phase shift mask blank and photomask

Method of producing a mask blank for photolithographic applications, and mask blank

Method for manufacturing of a mask blank for EUV photolithography and mask blank

Mask blank having a protection layer

Attenuating phase shift mask blank and photomask

InventorID:

4387437 ⎘