Crolles
France
14
2007-12-06
The entities that hold a legal rights for patent applications filed by inventor Barr Alexander L.:
Alexander L. Barr from Crolles, FR has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for forming a semiconductor structure having a strained silicon layer
#2 | 2007-10-11Semiconductor device structure
#3 | 2007-04-12Method for making a semiconductor structure using silicon germanium
#4 | 2006-10-12Method of making a dual strained channel semiconductor device
#5 | 2006-05-04Semiconductor device structure and method therefor
#6 | 2006-04-20Low RC product transistors in SOI semiconductor process
#7 | 2006-04-20Channel orientation to enhance transistor performance
#8 | 2006-03-30Method for forming a semiconductor device having a strained channel and a heterojunction source/drain
#9 | 2006-03-30Double gate device having a heterojunction source/drain and strained channel
#10 | 2006-02-23Graded semiconductor layer
#11 | 2005-11-03Method for making a semiconductor structure using silicon germanium
#12 | 2005-08-18Semiconductor structure having strained semiconductor and method therefor
#13 | 2005-03-31Semiconductor layer formation
#14 | 2005-03-31Template layer formation
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