Dwayne L. LaBrake

System and Method for Aligning Bonding Pads with Bonding Locations using Moiré Patterns

Superstrate and a method of using the same

Superstrate and a method of using the same

Planarization process and apparatus

Fluid dispense methodology and apparatus for imprint lithography

Method for forming planarized etch mask structures over existing topography

Method of reverse tone patterning

Methods for uniform imprint pattern transfer of sub-20 nm features

Optically Absorptive Material for Alignment Marks

Large Area Patterning of Nano-Sized Shapes

Extrusion reduction in imprint lithography

REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS

Optically absorptive material for alignment marks

Controlling Thickness of Residual Layer

Critical dimension control during template formation

Template pillar formation

High contrast alignment marks through multiple stage imprinting

Vapor Delivery System For Use in Imprint Lithography

Contaminate detection and substrate cleaning

ADHESION LAYERS IN NANOIMPRINT LITHOGRAHY

Self-Aligned Cross-Point Memory Fabrication

Large area patterning of nano-sized shapes

Facilitating adhesion between substrate and patterned layer

Double Sidewall Angle Nano-Imprint Template

CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION

Extrusion reduction in imprint lithography

Template Pillar Formation

Controlling Thickness of Residual Layer

Alignment Using Moire Patterns

Reduced Residual Formation in Etched Multi-Layer Stacks

Self-aligned cross-point memory fabrication

Method of controlling the critical dimension of structures formed on a substrate

Optical and optoelectronic articles

Optical and optoelectronic articles

System and method for characterizing optical devices