Aalen
Germany
32
2025-11-20
The entities that hold a legal rights for patent applications filed by inventor SCHICKETANZ Thomas:
Thomas SCHICKETANZ from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR PRODUCING A MIRROR ASSEMBLY, AND COATING SYSTEM
#2 | 2023-12-28PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME ULTRAVIOLET WAVELENGTH RANGE AND REFLECTIVE OPTICAL ELEMENT
#3 | 2022-07-28Method and device for characterizing the surface shape of an optical element
#4 | 2021-05-13Method and device for characterizing the surface shape of an optical element
#5 | 2019-07-11Optical system, in particular for a microlithographic projection exposure apparatus
#6 | 2019-04-25Projection optical unit for EUV projection lithography
#7 | 2019-02-21CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND PROJECTION EXPOSURE METHOD
#8 | 2018-12-27CATADIOPTRIC PROJECTION OBJECTIVE
#9 | 2018-04-05Catadioptric projection objective comprising deflection mirrors and projection exposure method
#10 | 2018-04-05Catadioptric projection objective
#11 | 2017-09-14Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element
#12 | 2017-02-23Catadioptric projection objective comprising deflection mirrors and projection exposure method
#13 | 2016-12-29Optical element and optical arrangement therewith
#14 | 2016-11-10EUV mirror and optical system comprising EUV mirror
#15 | 2016-10-13METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR
#16 | 2016-09-15Reflective optical element, and optical system of a microlithographic projection exposure apparatus
#17 | 2016-08-11Catadioptric projection objective
#18 | 2016-07-07EUV mirror and optical system comprising EUV mirror
#19 | 2016-06-02Catadioptric projection objective comprising deflection mirrors and projection exposure method
#20 | 2015-10-22Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
#21 | 2015-03-05Catadioptric projection objective comprising deflection mirrors and projection exposure method
#22 | 2015-02-26Catadioptric projection objective
#23 | 2014-12-18Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
#24 | 2014-11-27Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
#25 | 2014-06-26Imaging catoptric EUV projection optical unit
#26 | 2014-03-20Method for correcting the surface form of a mirror
#27 | 2013-09-19Catadioptric projection objective
#28 | 2012-09-20Catadioptric projection objective comprising deflection mirrors and projection exposure method
#29 | 2011-06-16Projection objective
#30 | 2011-04-21Projection objective for a microlithographic EUV projection exposure apparatus
#31 | 2011-02-17Catadioptric projection objective
#32 | 2010-04-22High transmission, high aperture catadioptric projection objective and projection exposure apparatus
441747 ⎘