Plano, Texas
United States
8
2007-05-24
The entities that hold a legal rights for patent applications filed by inventor Eissa Mona M.:
Mona M. Eissa from Plano, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
#2 | 2006-12-26Effective solution and process to wet-etch metal-alloy films in semiconductor processing
#3 | 2006-02-14Control of dissolved gas levels in deionized water
#4 | 2005-11-22Hydrogen plasma photoresist strip and polymeric residue cleanup processs for low dielectric constant materials
#5 | 2005-11-10Selective dry etching of tantalum and tantalum nitride
#6 | 2005-10-06Control of dissolved gas levels in deionized water
#7 | 2005-09-29Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
#8 | 2005-09-06Selective dry etching of tantalum and tantalum nitride
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