Inventor profile of:

Joachim Mai

City:

Nobitz

Country:

Germany

Published Applications:

15

Last publication date:

2019-12-26

Top Assignees for applications by Joachim Mai

The entities that hold a legal rights for patent applications filed by inventor Mai Joachim:

Recent patent applications by Mai Joachim

Joachim Mai from Nobitz, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-12-26
US20190390344A1
Chemistry; metallurgy

PROCESS MODULE

#2 | 2019-08-15
US20190252156A1
Electricity

Plasma treatment device with two microwave plasma sources coupled to one another, and method for operating a plasma treatment device of this kind

#3 | 2018-10-11
US20180294135A1
Electricity

Device for the Extraction of Electrical Charge Carriers from a Charge Carrier Generation Space and Method for Operating Such a Device

#4 | 2016-08-18
US20160237555A1
Chemistry; metallurgy

Multi-Magnetron Arrangement

#5 | 2016-07-28
US20160217978A1
Electricity

Plasma generation device

#6 | 2016-06-23
US20160181070A1
Electricity

DEVICE FOR ION IMPLANTATION

#7 | 2015-08-13
US20150225847A1
Chemistry; metallurgy

Gas separation

#8 | 2015-06-04
US20150152555A1
Chemistry; metallurgy

PROCESS MODULE

#9 | 2015-04-02
US20150091442A1
Electricity

Microwave plasma generating device and method for operating same

#10 | 2014-12-18
US20140369791A1
Electricity

Substrate processing device

#11 | 2013-09-19
US20130243966A1
Chemistry; metallurgy

METHOD AND DEVICE FOR ION IMPLANTATION

#12 | 2012-12-06
US20120304933A1
Electricity

Parallel plate reactor for uniform thin film deposition with reduced tool foot-print

#13 | 2009-10-01
US20090242131A1
Electricity

ECR PLASMA SOURCE

#14 | 2008-05-15
US20080110745A1
Electricity

Method and device for ion beam processing of surfaces

#15 | 2006-11-16
US20060254521A1
Electricity

Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening

InventorID:

444022 ⎘