Inventor profile of:

Gregory P. Prokopowicz

City:

Worcester, Massachusetts

Country:

United States

Published Applications:

22

Last publication date:

2022-02-10

Top Assignees for applications by Gregory P. Prokopowicz

The entities that hold a legal rights for patent applications filed by inventor Prokopowicz Gregory P.:

Recent patent applications by Prokopowicz Gregory P.

Gregory P. Prokopowicz from Worcester, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2022-02-10
US20220043342A1
Physics

Photoresist compositions and pattern formation methods

#2 | 2017-11-02
US20170313889A1
Chemistry; metallurgy

Coating compositions suitable for use with an overcoated photoresist

#3 | 2017-04-20
US20170108776A1
Physics

Coating compositions suitable for use with an overcoated photoresist

#4 | 2016-02-11
US20160040021A1
Chemistry; metallurgy

Adhesion promoter

#5 | 2016-01-14
US20160009924A1
Chemistry; metallurgy

Coating compositions suitable for use with an overcoated photoresist

#6 | 2015-12-10
US20150353482A1
Chemistry; metallurgy

Photoresist comprising nitrogen-containing compound

#7 | 2015-10-01
US20150279512A1
Electricity

Adhesion promoter

#8 | 2015-10-01
US20150279511A1
Electricity

Adhesion promoter

#9 | 2015-03-12
US20150072290A1
Physics

Coating compositions

#10 | 2014-05-01
US20140120469A1
Physics

THERMAL ACID GENERATORS FOR USE IN PHOTORESIST

#11 | 2014-05-01
US20140120244A1
Chemistry; metallurgy

Adhesion promoter

#12 | 2014-05-01
US20140120242A1
Chemistry; metallurgy

ADHESION PROMOTER

#13 | 2013-12-26
US20130344439A1
Physics

Photoresists comprising amide component

#14 | 2013-12-26
US20130344438A1
Physics

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

#15 | 2013-09-19
US20130244178A1
Physics

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

#16 | 2012-11-29
US20120301823A1
Chemistry; metallurgy

Polymer composition and photoresist comprising the polymer

#17 | 2012-03-29
US20120077120A1
Physics

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

#18 | 2011-09-15
US20110223535A1
Chemistry; metallurgy

Photoresist comprising nitrogen-containing compound

#19 | 2011-01-06
US20110003250A1
Physics

Coating compositions suitable for use with an overcoated photoresist

#20 | 2010-11-25
US20100297556A1
Physics

Coating compositions suitable for use with an overcoated photoresist

#21 | 2007-03-29
US20070072112A1
Physics

Coating compositions

#22 | 2006-03-30
US20060069171A1
Electricity

Composition and method

InventorID:

444404 ⎘