Dandan Wan

City:

Shanghai

Country:

China

Published Applications:

Last publication date:

2018-03-08

Top Assignees for applications by Dandan Wan

The entities that hold a legal rights for patent applications filed by inventor Wan Dandan:

Dandan Wan from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

ANODIZATION AND POLISH SURFACE TREATMENT FOR HIGH GLOSS DEEP BLACK FINISH

SHOT BLASTING MATERIAL USED FOR SILICON SUBSTRATE SURFACE TREATMENT AND METHOD FOR PREPARING SILICON SUBSTRATE

InventorID:

444836 ⎘