Aalen
Germany
17
2015-01-01
The entities that hold a legal rights for patent applications filed by inventor Ossmann Jens:
Jens Ossmann from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Illumination system for EUV lithography
#2 | 2013-09-26Illumination optical system for projection lithography
#3 | 2012-11-29Catoptric illumination system for microlithography tool
#4 | 2011-09-29ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY
#5 | 2011-04-28Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus
#6 | 2011-03-17Illumination optics for EUV microlithography and related system and apparatus
#7 | 2010-10-07Illumination optics for microlithography
#8 | 2009-12-31Catoptric illumination system for microlithography tool
#9 | 2009-12-24EUV illumination system
#10 | 2009-10-08ILLUMINATING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#11 | 2009-04-09Illumination optical system for microlithography
#12 | 2009-02-12ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY
#13 | 2008-11-13ILLUMINATION SYSTEM FOR A PROJECTION EXPOSURE APPARATUS WITH WAVELENGTHS LESS THAN OR EQUAL TO 193 nm
#14 | 2008-10-23PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#15 | 2008-02-28ILLUMINATION SYSTEM WITH A DETECTOR FOR REGISTERING A LIGHT INTENSITY
#16 | 2007-12-27EUV illumination system
#17 | 2007-10-11Illumination system with zoom objective
453365 ⎘