Aalen
Germany
15
2015-06-04
The entities that hold a legal rights for patent applications filed by inventor Stuetzle Ralf:
Ralf Stuetzle from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for adjusting an illumination setting
#2 | 2013-09-26Illumination optical system for projection lithography
#3 | 2012-11-29Catoptric illumination system for microlithography tool
#4 | 2012-06-28Illumination optical unit for microlithography
#5 | 2011-09-29ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY
#6 | 2011-07-21Illumination system for EUV microlithography
#7 | 2011-04-28Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus
#8 | 2011-03-17Illumination optics for EUV microlithography and related system and apparatus
#9 | 2010-10-07Illumination optics for microlithography
#10 | 2009-12-31Catoptric illumination system for microlithography tool
#11 | 2009-10-08ILLUMINATING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#12 | 2009-04-09Illumination optical system for microlithography
#13 | 2008-12-18Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installation
#14 | 2008-10-23PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#15 | 2008-01-24Collector for an illumination system
453367 ⎘