Wayne Moreau

City:

Wappingers Falls, New York

Country:

United States

Published Applications:

Last publication date:

2006-06-15

Top Assignees for applications by Wayne Moreau

The entities that hold a legal rights for patent applications filed by inventor Moreau Wayne:

INTERNATIONAL BUSINESS MACHINES CORPORATION 4 ARMONK, NY United States

Recent patent applications by Moreau Wayne

Wayne Moreau from Wappingers Falls, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2006-06-15

US20060127800A1

Physics

High sensitivity resist compositions for electron-based lithography

#2 | 2006-03-16

US20060058489A1

Physics

Silicon-containing compositions for spin-on arc/hardmask materials

#3 | 2005-04-28

US20050087490A1

Performing operations; transporting

Process for removing impurities from low dielectric constant films disposed on semiconductor devices

#4 | 2005-04-07

US20050074689A1

Physics

Silicon-containing compositions for spin-on ARC/hardmask materials

InventorID:

4591501 ⎘