Christopher A. Bode

Process control using analysis of an upstream process

Associating data with workpieces and correlating the data with yield data

Method and apparatus for predicting device electrical parameters during fabrication

Controlling processing of semiconductor wafers based upon end of line parameters

Method and apparatus for dynamic adjustment of a sensor sampling rate

Method and apparatus for integrating multiple sample plans

Method and apparatus for dynamic adjustment of sensor and/or metrology sensitivities

Method and apparatus for dynamic adjustment of a sampling plan based on wafer electrical test data

Applying a self-adaptive filter to a drifting process

Method and apparatus for fast disturbance detection and classification

Method and apparatus for performing field-to-field compensation

Method and apparatus for initializing tool controllers based on tool event data

Controlling cumulative wafer effects

Method and apparatus for providing excitation for a process controller

Method and system for calibrating integrated metrology systems and stand-alone metrology systems that acquire wafer state data

Matching data related to multiple metrology tools

Method and apparatus for updating control state variables of a process control model based on rework data

Multi-level process data representation

Dispatch and/or disposition of material based upon an expected parameter result

Method and apparatus for controlling process target values based on manufacturing metrics

Prioritizing an application of correction in a multi-input control system

Method and apparatus for distinguishing between sources of process variation

Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information

Updating process controller based upon fault detection analysis