Austin, Texas
United States
11
2006-12-07
The entities that hold a legal rights for patent applications filed by inventor Tseng Hsing H.:
Hsing H. Tseng from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
In-situ nitridation of high-k dielectrics
#2 | 2006-10-19Method of forming a semiconductor device having a high-k dielectric
#3 | 2006-10-05Method of forming an electronic device
#4 | 2006-10-05Transitional dielectric layer to improve reliability and performance of high dielectric constant transistors
#5 | 2006-08-31Method of making a nitrided gate dielectric
#6 | 2006-05-04Forming gas anneal process for high dielectric constant gate dielectrics in a semiconductor fabrication process
#7 | 2006-04-20Plasma impurification of a metal gate in a semiconductor fabrication process
#8 | 2006-03-21Method for forming a layer using a purging gas in a semiconductor process
#9 | 2005-04-26Radical oxidation and/or nitridation during metal oxide layer deposition process
#10 | 2005-04-21Multi-layer dielectric containing diffusion barrier material
#11 | 2005-02-03Process for forming dual metal gate structures
4610991 ⎘