• Recent
  • Class
  • Inventors
  • Assignees
  • Top Lists
  • Pricing
  • Account
Patents-Review.com
  1. Home
  2. Inventor
  3. I
  4. Ina…
  5. Inamura Kohei
🔗 Permalink
Inventor profile of:

Kohei Inamura

City:

Tokyo

Country:

Japan

Published Applications:

6

Last publication date:

2025-12-25

Top Assignees for applications by Kohei Inamura

The entities that hold a legal rights for patent applications filed by inventor Inamura Kohei:

  • ASTELLAS PHARMA INC. 3 Tokyo, Japan

Recent patent applications by Inamura Kohei

Kohei Inamura from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-12-25
US20250388569A1
Chemistry; metallurgy

HETEROCYCLIC COMPOUND FOR INHIBITING AND/OR INDUCING DEGRADATION OF KRAS PROTEIN

#2 | 2025-11-06
US20250340561A1
Chemistry; metallurgy

QUINAZOLINE COMPOUND FOR INDUCING DEGRADATION OF G12D MUTANT KRAS PROTEIN

#3 | 2025-06-26
US20250206751A1
Chemistry; metallurgy

HETEROCYCLIC COMPOUND FOR INDUCING DEGRADATION OF G12D MUTANT KRAS PROTEIN

#4 | 2025-05-08
US20250145631A1
Chemistry; metallurgy

HETEROCYCLIC COMPOUND ACTING ON G12D MUTANT KRAS PROTEIN

#5 | 2024-06-06
US20240182483A1
Chemistry; metallurgy

QUINAZOLINE COMPOUND FOR INDUCING DEGRADATION OF G12D MUTANT KRAS PROTEIN

#6 | 2006-06-01
US20060116315A1
Chemistry; metallurgy

Method of screening agent for improving memory and learning ability

InventorID:

4635284 ⎘

  1. Home
  2. Inventor
  3. I
  4. Ina…
  5. Inamura Kohei

Some parts © 2022-2026 Patents-Review.com

Browse & Discovery
  • Home
  • Patent Classification
  • Inventor Index
  • Assignee Index
  • Interesting Applications
Search & Tools
  • Basic Search
  • Advanced Search
  • Patent Alerts
  • Top Lists
  • Statistics
Information & Resources
  • About US Patent System
  • Terms & Privacy
  • Pricing
  • Contact
Quick Access
  • Latest Applications
  • Top Inventors 2026
  • Top Assignees 2026
  • Featured Patents
Disclaimer: This website is intended for informational purposes only, and its content is based on public patent records. Please note that some sections of this website have been created or processed using machine learning models. We provide content in good faith but make no guarantees regarding accuracy or completeness. By using this site, you accept any risks and waive claims against us for errors or omissions.