Kirk J. Strozewski

City:

Round Rock, Texas

Country:

United States

Published Applications:

Last publication date:

2006-06-22

Top Assignees for applications by Kirk J. Strozewski

The entities that hold a legal rights for patent applications filed by inventor Strozewski Kirk J.:

FREESCALE SEMICONDUCTOR, INC 4 Austin, TX United States

Recent patent applications by Strozewski Kirk J.

Kirk J. Strozewski from Round Rock, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2006-06-22

US20060136861A1

Physics

Layout modification using multilayer-based constraints

#2 | 2005-02-22

US10346263

Semiconductor fabrication method for making small features

#3 | 2005-02-17

US20050035459A1

Electricity

Semiconductor device having a multiple thickness interconnect

#4 | 2005-01-04

US10327403

Method for forming a passivation layer for air gap formation

InventorID:

4650668 ⎘