Armin Semmler

City:

Munchen

Country:

Germany

Published Applications:

Last publication date:

2006-08-24

Top Assignees for applications by Armin Semmler

The entities that hold a legal rights for patent applications filed by inventor Semmler Armin:

Armin Semmler from Munchen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask

Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools

Method for producing a mask layout avoiding imaging errors for a mask

Method for producing for a mask a mask layout which avoids aberrations

InventorID:

4690334 ⎘