Martin Niehoff

City:

Munich

Country:

Germany

Published Applications:

Last publication date:

2006-10-05

Top Assignees for applications by Martin Niehoff

The entities that hold a legal rights for patent applications filed by inventor Niehoff Martin:

Martin Niehoff from Munich, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Immersion lithography method and device for illuminating a substrate

Lithography arrangement and procedure that produces a lithography

InventorID:

4710571 ⎘