Mami Nishimura

City:

Sodegaura-shi

Country:

Japan

Published Applications:

Last publication date:

2019-01-31

Top Assignees for applications by Mami Nishimura

The entities that hold a legal rights for patent applications filed by inventor Nishimura Mami:

IDEMITSU KOSAN CO., LTD. 6 Tokyo, Japan

Recent patent applications by Nishimura Mami

Mami Nishimura from Sodegaura-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-01-31

US20190035626A1

Electricity

Sputtering target, oxide semiconductor thin film, and method for producing oxide semiconductor thin film

#2 | 2015-10-29

US20150311071A1

Electricity

SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, AND METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM

#3 | 2014-05-29

US20140145124A1

Chemistry; metallurgy

In—Ga—Zn oxide sputtering target and method for producing same

#4 | 2014-04-17

US20140103268A1

Electricity

InO—SnO—ZnO sputtering target

#5 | 2014-04-17

US20140102892A1

Chemistry; metallurgy

IN2O3-ZNO SPUTTERING TARGET

#6 | 2014-03-27

US20140084289A1

Electricity

Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn

#7 | 2013-10-10

US20130264565A1

Electricity

SEMICONDUCTOR THIN FILM, THIN FILM TRANSISTOR AND PRODUCTION METHOD THEREFOR

#8 | 2012-12-13

US20120313057A1

Chemistry; metallurgy

In-Ga-Sn oxide sinter, target, oxide semiconductor film, and semiconductor element

InventorID:

474068 ⎘