Hiromitsu OSHIMA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2015-11-26

Top Assignees for applications by Hiromitsu OSHIMA

The entities that hold a legal rights for patent applications filed by inventor OSHIMA Hiromitsu:

Hiromitsu OSHIMA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING FIN-SHAPED FIELD EFFECT TRANSISTOR

Semiconductor device having fin-shaped field effect transistor and manufacturing method thereof

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Method of manufacturing semiconductor device

METHOD FOR FORMING TRENCH GATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

InventorID:

474137 ⎘