David E. Seelye

City:

Rochester, New York

Country:

United States

Published Applications:

Last publication date:

2006-12-28

Top Assignees for applications by David E. Seelye

The entities that hold a legal rights for patent applications filed by inventor Seelye David E.:

David E. Seelye from Rochester, US has applied for patents for these inventions. The list has both pending applications and granted patents:

System for synthesis of device forming monomers

Vinylchloroformate-free synthesis of vinyl and allyl(thio) carbamates

High refractive index polymeric siloxysilane compositions

High refractive index polymeric siloxysilane compositions

High refractive index polymeric siloxysilane compositions

InventorID:

4757006 ⎘