Prakash C. Dev

City:

Plano, Texas

Country:

United States

Published Applications:

Last publication date:

2005-11-01

Top Assignees for applications by Prakash C. Dev

The entities that hold a legal rights for patent applications filed by inventor Dev Prakash C.:

Prakash C. Dev from Plano, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device

Method to improve bitline contact formation using a line mask

InventorID:

4770536 ⎘