New Windsor, New York
United States
3
2005-11-01
The entities that hold a legal rights for patent applications filed by inventor Dobuzinsky David:
David Dobuzinsky from New Windsor, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device
#2 | 2005-03-22Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials
#3 | 2005-03-10Reduced cap layer erosion for borderless contacts
4802231 ⎘