Saratoga, California
United States
41
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor MARKS Jeffrey:
Jeffrey MARKS from Saratoga, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#2 | 2025-02-13VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
#3 | 2024-12-19PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#4 | 2024-10-31PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#5 | 2024-08-01PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS
#6 | 2024-08-01PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS
#7 | 2024-06-20PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS
#8 | 2024-06-20PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS
#9 | 2024-05-30PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS
#10 | 2023-08-31VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
#11 | 2023-08-24VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
#12 | 2023-06-15Plasma etching chemistries of high aspect ratio features in dielectrics
#13 | 2023-05-18BIOASSAY SUBSTRATE HAVING FIDUCIAL DOMAINS AND METHODS OF MANUFACTURE THEREOF
#14 | 2022-08-04Photoresist development with halide chemistries
#15 | 2022-03-10VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
#16 | 2021-01-07Plasma etching chemistries of high aspect ratio features in dielectrics
#17 | 2020-05-21INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH)
#18 | 2020-03-19Vacuum-integrated hardmask processes and apparatus
#19 | 2019-10-10Dry plasma etch method to pattern MRAM stack
#20 | 2019-05-09Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)
#21 | 2019-03-28Vacuum-integrated hardmask processes and apparatus
#22 | 2018-08-16Directional deposition on patterned structures
#23 | 2018-08-16Ale smoothness: in and outside semiconductor industry
#24 | 2018-02-01Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch)
#25 | 2018-01-18Dry plasma etch method to pattern MRAM stack
#26 | 2018-01-04Vacuum-integrated hardmask processes and apparatus
#27 | 2017-06-22DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES
#28 | 2017-04-27Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)
#29 | 2017-03-09ALE smoothness: in and outside semiconductor industry
#30 | 2017-02-23Atomic layer etching of tungsten and other metals
#31 | 2016-12-08Atomic layer etching of GaN and other III-V materials
#32 | 2016-10-20Dry plasma etch method to pattern MRAM stack
#33 | 2016-07-14Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)
#34 | 2015-11-26Method to etch non-volatile metal materials
#35 | 2015-10-01Method to etch non-volatile metal materials
#36 | 2015-10-01Method to etch non-volatile metal materials
#37 | 2015-08-06Vacuum-integrated hardmask processes and apparatus
#38 | 2015-03-19Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods
#39 | 2014-10-16CVD based metal/semiconductor OHMIC contact for high volume manufacturing applications
#40 | 2013-10-17LAYER-LAYER ETCH OF NON VOLATILE MATERIALS
#41 | 2012-04-12Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods
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