Hiroshi Echizen

City:

Nara

Country:

Japan

Published Applications:

Last publication date:

2006-03-30

Top Assignees for applications by Hiroshi Echizen

The entities that hold a legal rights for patent applications filed by inventor Echizen Hiroshi:

Hiroshi Echizen from Nara, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program

Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device

Wet process gas treatment apparatus

Long-Term sputtering method

InventorID:

4825725 ⎘