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Inventor profile of:

Yoshihiro Kamon

City:

Hiroshima

Country:

Japan

Published Applications:

4

Last publication date:

2008-01-08

Top Assignees for applications by Yoshihiro Kamon

The entities that hold a legal rights for patent applications filed by inventor Kamon Yoshihiro:

  • Mitsubishi Rayon Co., Ltd. 4 Tokyo, Japan
  • Mitsubishi Rayon Co.,Ltd. 1 Tokyo, Japan

Recent patent applications by Kamon Yoshihiro

Yoshihiro Kamon from Hiroshima, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2008-01-08
US10492207
-

5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process

#2 | 2006-05-09
US10433570
-

(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns

#3 | 2005-08-09
US10332770
-

Resins for resists and chemically amplifiable resist compositions

#4 | 2005-05-26
US20050113538A1
Physics

(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

InventorID:

4849612 ⎘

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