Webster, New York
United States
20
2014-07-17
The entities that hold a legal rights for patent applications filed by inventor DiRubio Christopher A.:
Christopher A. DiRubio from Webster, US has applied for patents for these inventions. The list has both pending applications and granted patents:
System and method for image surface preparation in an aqueous inkjet printer
#2 | 2013-12-19Transfix roller with adjustable crown for use in an indirect printer
#3 | 2013-11-07Transfix roller with adaptive center loading for use in an indirect printer
#4 | 2013-10-17Method and system for closed-loop control of nip width and image transfer field uniformity for an image transfer system
#5 | 2012-12-06SINGLE BTR ROLL AT STRIPPER FOR CONTINUOUS WEB TRANSFER
#6 | 2012-05-17Testing transfer nips of printing devices using transfer field uniformity maps
#7 | 2012-03-01Image transfer roller (ITR) utilizing an elastomer crown
#8 | 2012-03-01Image transfer nip method and apparatus using constant current controls
#9 | 2010-12-30Multi-color printing system and method for reducing the transfer field through closed-loop controls
#10 | 2010-08-05Multi-color printing system and method for high toner pile height printing
#11 | 2009-12-10Multi-color printing system and method for high toner pile height printing
#12 | 2008-09-11Squarewave charging of a photoreceptor
#13 | 2008-07-17Mass-based sensing of charging knee for active control of charger settings
#14 | 2008-05-01Method and system for improving electrophotographic run cost through cyclic efficiency of the charging device
#15 | 2006-11-28Printing device heating element and method of use thereof
#16 | 2006-10-05Toner monitoring systems and methods
#17 | 2006-10-05Full-width array sensing of two-dimensional residual mass structure to enable mitigation of specific defects
#18 | 2006-05-18Xerographic transfer station using a belt
#19 | 2006-05-18Control system for a xerographic transfer station using a belt
#20 | 2005-12-29Biased charge roller with embedded electrodes with post-nip breakdown to enable improved charge uniformity
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