Wallkill, New York
United States
2
2005-07-14
The entities that hold a legal rights for patent applications filed by inventor Gehres Rainer E.:
Rainer E. Gehres from Wallkill, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Reduction of chemical mechanical planarization (CMP) scratches with sacrificial dielectric polish stop
#2 | 2005-07-07Method of making field effect transistors having self-aligned source and drain regions using independently controlled spacer widths
4872886 ⎘