Handa
Japan
11
2012-05-24
The entities that hold a legal rights for patent applications filed by inventor Tanaka Mitsuhiro:
Mitsuhiro Tanaka from Handa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Epitaxial substrate for semiconductor device, method for manufacturing epitaxial substrate for semiconductor device, and semiconductor device
#2 | 2011-06-07Apparatus for fabricating a III-V nitride film
#3 | 2010-03-04Epitaxial substrate, semiconductor device substrate, and HEMT device
#4 | 2008-12-18Epitaxial wafers, method for manufacturing of epitaxial wafers, method of suppressing bowing of these epitaxial wafers and semiconductor multilayer structures using these epitaxial wafers
#5 | 2006-06-27Semiconductor element
#6 | 2006-01-24Method for fabricating a III nitride film, an underlayer for fabricating a III nitride film and a method for fabricating the same underlayer
#7 | 2005-09-13Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method
#8 | 2005-08-04Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method
#9 | 2005-02-10Epitaxial wafers, method for manufacturing of epitaxial wafers, method of suppressing bowing of these epitaxial wafers and semiconductor multilayer structures using these epitaxial wafers
#10 | 2005-01-18III nitride epitaxial substrate, epitaxial substrate for III nitride element, and III nitride element that includes a surface nitride layer formed on the main surface of a sapphire single crystal
#11 | 2005-01-13Method for manufacturing nitride film including high-resistivity GaN layer and epitaxial substrate manufactured by the method
4889636 ⎘