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Inventor profile of:

Richard Hogle

City:

Oceanside, California

Country:

United States

Published Applications:

Last publication date:

2013-10-24

Top Assignees for applications by Richard Hogle

The entities that hold a legal rights for patent applications filed by inventor Hogle Richard:

Linde. Inc. 1 Murray Hill, NJ United States

Recent patent applications by Hogle Richard

Richard Hogle from Oceanside, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2013-10-24

US20130276820A1

Performing operations; transporting

CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE

#2 | 2013-05-30

US20130133697A1

Performing operations; transporting

PREVENTION OF POST-PECVD VACUUM AND ABATEMENT SYSTEM FOULING USING A FLUORINE CONTAINING CLEANING GAS CHAMBER

#3 | 2012-11-22

US20120295038A1

Chemistry; metallurgy

METHOD AND APPARATUS FOR USING SOLUTION BASED PRECURSORS FOR ATOMIC LAYER DEPOSITION

#4 | 2012-11-22

US20120294753A1

Chemistry; metallurgy

METHOD AND APPARATUS FOR USING SOLUTION BASED PRECURSORS FOR ATOMIC LAYER DEPOSITION

#5 | 2009-09-03

US20090220374A1

Chemistry; metallurgy

METHOD AND APPARATUS FOR USING SOLUTION PRECURSORS FOR ATOMIC LAYER DEPOSITION

#6 | 2007-04-12

US20070079849A1

Chemistry; metallurgy

Integrated chamber cleaning system

#7 | 2007-04-05

US20070074743A1

Chemistry; metallurgy

H2 conditioning of chamber following cleaning cycle

#8 | 2006-12-07

US20060276049A1

Chemistry; metallurgy

High efficiency trap for deposition process

#9 | 2006-11-30

US20060269667A1

Chemistry; metallurgy

Method and apparatus for using solution based precursors for atomic layer deposition

#10 | 2006-01-26

US20060016459A1

Electricity

High rate etching using high pressure F2 plasma with argon dilution

#11 | 2005-11-10

US20050250347A1

Electricity

Method and apparatus for maintaining by-product volatility in deposition process

InventorID:

492097 ⎘