Oberkochen
Germany
37
2024-10-03
The entities that hold a legal rights for patent applications filed by inventor Xalter Stefan:
Stefan Xalter from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, MIRROR, EUV LITHOGRAPHY SYSTEM, FLUID FEED APPARATUS AND METHOD FOR FEEDING A FLUID
#2 | 2023-11-02OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY
#3 | 2022-04-07Stop, optical system and lithography apparatus
#4 | 2021-03-18Projection exposure apparatus for semiconductor lithography
#5 | 2018-08-30METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#6 | 2017-06-29Connection arrangement for a force-fit connection between ceramic components
#7 | 2016-09-29Diaphragm changing device
#8 | 2016-09-15Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#9 | 2016-06-23Optical imaging arrangement with simplified manufacture
#10 | 2015-10-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#11 | 2015-06-18LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHOD
#12 | 2014-08-21Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#13 | 2014-08-14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#14 | 2014-01-23LITHOGRAPHY APPARATUS AND METHOD
#15 | 2013-10-24Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#16 | 2012-12-27Optical system for semiconductor lithography
#17 | 2012-11-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#18 | 2012-07-26Optical arrangement in a projection exposure apparatus for EUV lithography
#19 | 2012-03-29DIAPHRAGM CHANGING DEVICE
#20 | 2011-09-08HOUSING STRUCTURE
#21 | 2011-08-11Low-contamination optical arrangement
#22 | 2011-07-28Optical assembly
#23 | 2010-10-28Optical assembly
#24 | 2010-06-03Diaphragm changing device
#25 | 2010-02-18Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#26 | 2009-12-10Housing structure
#27 | 2009-10-01Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#28 | 2009-08-20Optical system for semiconductor lithography
#29 | 2009-07-23SUPPORT FOR AN OPTICAL ELEMENT
#30 | 2009-05-28OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY
#31 | 2009-02-26Actuator device
#32 | 2008-08-14Optical Assembly Structure Comprising a Connecting Body with Thermal Expansion Compensations Means
#33 | 2008-07-17Optical assembly
#34 | 2007-03-08Diaphragm changing device
#35 | 2006-11-23Reflecting optical element with eccentric optical passageway
#36 | 2005-05-24System for damping oscillations
#37 | 2005-01-18Optical element deformation system
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