Berkeley, California
United States
9
2022-11-17
The entities that hold a legal rights for patent applications filed by inventor Wu Chenghao:
Chenghao Wu from Berkeley, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SUBSTRATE SURFACE MODIFICATION WITH HIGH EUV ABSORBERS FOR HIGH PERFORMANCE EUV PHOTORESISTS
#2 | 2022-10-27DRY CHAMBER CLEAN OF PHOTORESIST FILMS
#3 | 2022-10-27PHOTORESIST WITH MULTIPLE PATTERNING RADIATION-ABSORBING ELEMENTS AND/OR VERTICAL COMPOSITION GRADIENT
#4 | 2022-09-29APPARATUS FOR PHOTORESIST DRY DEPOSITION
#5 | 2022-09-29BAKE STRATEGIES TO ENHANCE LITHOGRAPHIC PERFORMANCE OF METAL-CONTAINING RESIST
#6 | 2022-09-22POSITIVE TONE DEVELOPMENT OF CVD EUV RESIST FILMS
#7 | 2022-01-20Dry development of resists
#8 | 2021-12-23Methods for making hard masks useful in next-generation lithography
#9 | 2021-01-14METHODS FOR MAKING EUV PATTERNABLE HARD MASKS
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