Inventor profile of:

Carsten Grass

City:

Dresden

Country:

Germany

Published Applications:

15

Last publication date:

2017-05-25

Top Assignees for applications by Carsten Grass

The entities that hold a legal rights for patent applications filed by inventor Grass Carsten:

Recent patent applications by Grass Carsten

Carsten Grass from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-05-25
US20170148919A1
Electricity

Semiconductor circuit element

#2 | 2017-02-28
US14982028
Electricity

Method including a formation of a control gate of a nonvolatile memory cell and semiconductor structure

#3 | 2016-12-06
US15060009
Electricity

Method of forming a gate mask for fabricating a structure of gate lines

#4 | 2016-07-14
US20160204218A1
Electricity

SEMICONDUCTOR STRUCTURE COMPRISING AN ALUMINUM GATE ELECTRODE PORTION AND METHOD FOR THE FORMATION THEREOF

#5 | 2016-05-05
US20160126132A1
Electricity

Methods for fabricating integrated circuits with isolation regions having uniform step heights

#6 | 2016-04-21
US20160111549A1
Electricity

Methods of forming a semiconductor circuit element and semiconductor circuit element

#7 | 2016-02-18
US20160049302A1
Electricity

Methods of forming a semiconductor circuit element and semiconductor circuit element

#8 | 2015-07-16
US20150200142A1
Electricity

Methods for fabricating integrated circuits with fully silicided gate electrode structures

#9 | 2015-07-16
US20150200140A1
Electricity

Methods for fabricating FinFET integrated circuits using laser interference lithography techniques

#10 | 2014-09-18
US20140264626A1
Electricity

METHOD FOR FORMING A GATE ELECTRODE OF A SEMICONDUCTOR DEVICE, GATE ELECTRODE STRUCTURE FOR A SEMICONDUCTOR DEVICE AND ACCORDING SEMICONDUCTOR DEVICE STRUCTURE

#11 | 2014-09-18
US20140264347A1
Electricity

Transistor with embedded strain-inducing material formed in cavities based on an amorphization process and a heat treatment

#12 | 2014-09-04
US20140246735A1
Electricity

Metal gate structure for semiconductor devices

#13 | 2014-03-06
US20140065808A1
Electricity

Method of forming a material layer in a semiconductor structure

#14 | 2013-10-31
US20130288435A1
Electricity

CET and gate current leakage reduction in high-k metal gate electrode structures by heat treatment after diffusion layer removal

#15 | 2013-10-24
US20130280873A1
Electricity

ENHANCED DEVICE RELIABILITY OF A SEMICONDUCTOR DEVICE BY PROVIDING SUPERIOR PROCESS CONDITIONS IN HIGH-K FILM GROWTH

InventorID:

497830 ⎘