Raphael ROCHAT

City:

Yokohama

Country:

Japan

Published Applications:

Last publication date:

2024-12-26

Top Assignees for applications by Raphael ROCHAT

The entities that hold a legal rights for patent applications filed by inventor ROCHAT Raphael:

Raphael ROCHAT from Yokohama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

DEPOSITION OF RUTHENIUM-CONTAINING FILMS BY NON-AROMATIZABLE CYCLIC-DIENE RUTHENIUM(0) COMPLEXES

STABLE BIS(ALKYL-ARENE) TRANSITION METAL COMPLEXES AND METHODS OF FILM DEPOSITION USING THE SAME

Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films

CYCLIC GERMANIUM SILYLAMIDO PRECURSORS FOR GE-CONTAINING FILM DEPOSITIONS AND METHODS OF USING THE SAME

InventorID:

4991818 ⎘