Hsinchu
Taiwan
47
2026-06-18
The entities that hold a legal rights for patent applications filed by inventor Lai Te-Yang:
Te-Yang Lai from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
#2 | 2026-03-12NANOSTRUCTURE FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING
#3 | 2025-11-27Volumeless Threshold Voltage Tuning for Stacked Device Structures
#4 | 2025-11-20GATE DIELECTRIC LAYERS FOR STACKED MULTI-GATE DEVICE
#5 | 2025-11-13SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#6 | 2025-11-06TRIPLE LAYER HIGH-K GATE DIELECTRIC STACK FOR WORKFUNCTION ENGINEERING
#7 | 2025-10-09Semiconductor Device Having Doped Gate Dielectric Layer and Method for Forming the Same
#8 | 2025-10-02DIPOLE-ENGINEERED HIGH-K GATE DIELECTRIC AND METHOD FORMING SAME
#9 | 2025-09-04SEMICONDUCTOR DEVICES INCLUDING CRYSTALLIZED LAYER HAVING MULTIPLE CRYSTALLINE ORIENTATIONS AND METHODS OF MANUFACTURE
#10 | 2025-01-16Volume-Less Dipole Incorporation into CFET Having Common Gate
#11 | 2024-11-21METHOD OF GAP FILLING FOR SEMICONDUCTOR DEVICE
#12 | 2024-10-03Semiconductor devices devices including crystallized layer having multiple crystalline orientations and methods of manufacture
#13 | 2024-09-19GATE DIELECTRIC LAYERS FOR STACKED MULTI-GATE DEVICE
#14 | 2024-09-12Dipole-Engineered High-K Gate Dielectric and Method Forming Same
#15 | 2024-08-29Volumeless Threshold Voltage Tuning for Stacked Device Structures
#16 | 2024-03-07Semiconductor device and manufacturing method for the semiconductor device
#17 | 2023-11-30SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SEMICONDUCTOR STRUCTURE
#18 | 2023-11-30Method of Gap Filling for Semiconductor Device
#19 | 2023-11-30Semiconductor devices and methods of manufacture
#20 | 2023-11-23Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#21 | 2023-11-23TRIPLE LAYER HIGH-K GATE DIELECTRIC STACK FOR WORKFUNCTION ENGINEERING
#22 | 2023-11-16Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#23 | 2023-11-16Nanostructure Field-Effect Transistor Device and Method of Forming
#24 | 2023-11-09Dipole-engineered high-k gate dielectric and method forming same
#25 | 2023-10-26Semiconductor Device and Method for Forming the Same
#26 | 2023-10-19SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#27 | 2023-10-05Semiconductor Device having Doped Gate Dielectric Layer and Method for Forming the Same
#28 | 2023-10-05Semiconductor device and method of manufacture
#29 | 2023-07-13Semiconductor Devices and Methods of Forming the Same
#30 | 2023-06-08Semiconductor Device Having Doped Gate Dielectric Layer and Method for Forming the Same
#31 | 2022-07-14Semiconductor device and manufacturing method for the semiconductor device
#32 | 2022-06-09Semiconductor structure and manufacturing method for the semiconductor structure
#33 | 2022-05-12Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#34 | 2022-03-17Nanostructure field-effect transistor device and method of forming
#35 | 2022-02-24Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#36 | 2021-12-23Triple layer high-k gate dielectric stack for workfunction engineering
#37 | 2021-12-02Semiconductor device and method of manufacture
#38 | 2021-12-02Dipole-engineered high-k gate dielectric and method forming same
#39 | 2021-10-07Semiconductor device and manufacturing method for the semiconductor device
#40 | 2021-09-23Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#41 | 2021-09-23Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices
#42 | 2021-09-09Semiconductor devices and methods of manufacture
#43 | 2021-08-26Semiconductor structure and manufacturing method for the semiconductor structure
#44 | 2021-07-22Method of gap filling for semiconductor device
#45 | 2021-02-25Method of gap filling for semiconductor device
#46 | 2021-02-25Semiconductor device and method of manufacture
#47 | 2021-02-25Semiconductor devices and methods of manufacture
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