Inventor profile of:

Yi-Ming DAI

City:

Hsinchu

Country:

Taiwan

Published Applications:

30

Last publication date:

2025-10-02

Top Assignees for applications by Yi-Ming DAI

The entities that hold a legal rights for patent applications filed by inventor DAI Yi-Ming:

Recent patent applications by DAI Yi-Ming

Yi-Ming DAI from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-10-02
US20250305115A1
Chemistry; metallurgy

MULTI-FUNCTIONAL SHUTTER DISK FOR THIN FILM DEPOSITION CHAMBER

#2 | 2025-09-18
US20250293064A1
Electricity

METHOD FOR DEPOSITING TARGET MATERIAL IN DEPOSITION CHAMBER WITH TILTABLE WORKPIECE HOLDER

#3 | 2025-03-13
US20250087536A1
Electricity

DEPOSITION SYSTEM AND METHOD

#4 | 2024-11-28
US20240392464A1
Chemistry; metallurgy

TREATMENT SYSTEM AND METHOD

#5 | 2024-05-23
US20240167149A1
Chemistry; metallurgy

MULTI-FUNCTIONAL SHUTTER DISK FOR THIN FILM DEPOSITION CHAMBER

#6 | 2023-11-30
US20230386942A1
Electricity

Deposition system and method

#7 | 2023-11-02
US20230352350A1
Electricity

Deposition system and method

#8 | 2023-10-19
US20230332322A1
Chemistry; metallurgy

Treatment system and method

#9 | 2023-08-31
US20230275048A1
Electricity

Semiconductor device and method of forming the same

#10 | 2022-11-10
US20220359232A1
Electricity

WAFER HOLDER FOR FILM DEPOSITION CHAMBER

#11 | 2022-11-10
US20220356578A1
Chemistry; metallurgy

SYSTEM AND METHOD FOR MONITORING AND PERFORMING THIN FILM DEPOSITION

#12 | 2022-11-10
US20220356562A1
Chemistry; metallurgy

Providing multifunctional shutter disk above the workpiece in the multifunctional chamber during degassing or pre-cleaning of the workpiece, and storing the multifunctional shutter disc during deposition process in the same multifunctional chamber

#13 | 2022-10-20
US20220336297A1
Electricity

Deposition system and method

#14 | 2022-10-06
US20220319895A1
Electricity

SYSTEM AND METHOD FOR CORRECTING NON-IDEAL WAFER TOPOGRAPHY

#15 | 2022-02-17
US20220051952A1
Electricity

Deposition system and method

#16 | 2021-12-16
US20210388524A1
Chemistry; metallurgy

Treatment system and method

#17 | 2021-11-11
US20210351143A1
Electricity

Semiconductor device and method of forming the same

#18 | 2021-06-24
US20210189561A1
Chemistry; metallurgy

SYSTEM AND METHOD FOR MONITORING AND PERFORMING THIN FILM DEPOSITION

#19 | 2021-04-22
US20210118700A1
Electricity

Movable wafer holder for film deposition chamber having six degrees of freedom

#20 | 2021-04-22
US20210115554A1
Chemistry; metallurgy

Shutter disk having lamp, power, and/or gas modules arranged at the first side of the shutter disk of thin film deposition chamber

#21 | 2020-12-24
US20200402828A1
Electricity

System and method for correcting non-ideal wafer topography

#22 | 2020-08-06
US20200251365A1
Electricity

Metrology method in wafer transportation

#23 | 2020-03-05
US20200075518A1
Electricity

Semiconductor device and method of forming the same

#24 | 2020-01-30
US20200035487A1
Electricity

Apparatus for fabricating a semiconductor device with target sputtering and target sputtering method for fabricating the semiconductor device

#25 | 2019-05-30
US20190164792A1
Electricity

Metrology method in wafer transportation

#26 | 2019-05-30
US20190163070A1
Physics

Metrology method in reticle transportation

#27 | 2019-01-31
US20190035664A1
Electricity

System and method for correcting non-ideal wafer topography

#28 | 2017-05-04
US20170123328A1
Physics

Photolithography tool and method thereof

#29 | 2016-06-30
US20160184839A1
Performing operations; transporting

Apparatus and method for supplying chemical solution on semiconductor substrate

#30 | 2007-02-01
US20070026320A1
Physics

Phase shift photomask performance assurance method

InventorID:

5116048 ⎘