Heidenheim
Germany
72
2018-06-14
The entities that hold a legal rights for patent applications filed by inventor DODOC Aurelian:
Aurelian DODOC from Heidenheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
#2 | 2018-02-01CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES
#3 | 2017-12-21Catadioptric Projection Objective With Intermediate Images
#4 | 2017-07-06Microlithography projection objective
#5 | 2016-09-22CATADIOPTRIC PROJECTION OBJECTIVE
#6 | 2016-05-12MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#7 | 2015-08-27Macro lens system and imaging apparatus
#8 | 2015-08-13Catadioptric projection objective with parallel, offset optical axes
#9 | 2015-07-23Catadioptric projection objective with intermediate images
#10 | 2015-02-26CATADIOPTRIC PROJECTION OBJECTIVE
#11 | 2014-12-25CATADIOPTRIC PROJECTION OBJECTIVE WITH TWO INTERMEDIATE IMAGES AND NO MORE THAN FOUR LENSES BETWEEN THE APERTURE STOP AND IMAGE PLANE
#12 | 2014-11-13Microlithography projection objective
#13 | 2014-10-09CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION
#14 | 2014-10-02MICROLITHOGRAPHY PROJECTION OBJECTIVE
#15 | 2014-05-01Catadioptric projection objective with intermediate images
#16 | 2014-04-24Immersion catadioptric projection objective having two intermediate images
#17 | 2014-04-24Catadioptric Projection Objective With Intermediate Images
#18 | 2014-03-20Catadioptric projection objective with intermediate images
#19 | 2014-02-13Optical system for imaging an object
#20 | 2013-05-16CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP
#21 | 2013-02-14Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
#22 | 2013-01-24Anamorphic objective
#23 | 2012-11-01CATADIOPTRIC PROJECTION OBJECTIVE
#24 | 2012-11-01Catadioptric projection objective including an aspherized plate
#25 | 2012-10-04Catadioptric projection objective
#26 | 2012-09-20Combination stop for catoptric projection arrangement
#27 | 2012-09-06Reflective optical imaging system
#28 | 2012-08-23MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE
#29 | 2012-06-14Imaging optical system and illumination optical system
#30 | 2012-05-31MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY HAVING SUCH MIRROR AND PROJECTION EXPOSURE APPARATUS HAVING SUCH PROJECTION OBJECTIVE
#31 | 2012-03-22Imaging optics and projection exposure installation for microlithography with an imaging optics
#32 | 2012-03-22IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE
#33 | 2012-01-05Catadioptric projection objective with pupil correction
#34 | 2011-10-27Catadioptric projection objective with mirror group
#35 | 2011-09-29Catadioptric projection objective
#36 | 2011-09-01Catadioptric projection objective
#37 | 2011-02-03Projection objective for lithography
#38 | 2010-10-21Catadioptric projection objective
#39 | 2010-10-21Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
#40 | 2010-10-07Catadioptric projection objective
#41 | 2010-09-16Microlithographic projection exposure apparatus with correction optical system that heats projection objective element
#42 | 2010-08-19PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL
#43 | 2010-07-08Projection objective and projection exposure apparatus including the same
#44 | 2010-03-25Optical system of a microlithographic projection exposure apparatus
#45 | 2010-02-25MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#46 | 2010-02-04PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#47 | 2010-01-28CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION
#48 | 2010-01-21Catadioptric projection objective
#49 | 2009-07-30Catadioptric projection objective
#50 | 2009-05-07Microlithography projection objective
#51 | 2009-03-26Symmetrical objective having four lens groups for microlithography
#52 | 2009-01-22PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
#53 | 2009-01-22Combination stop for catoptric projection arrangement
#54 | 2008-12-25MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#55 | 2008-12-18CATADIOPTRIC PROJECTION OBJECTIVE
#56 | 2008-12-18OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#57 | 2008-12-04Catadioptric projection objective
#58 | 2008-11-20CATADIOPTRIC PROJECTION OBJECTIVE
#59 | 2008-09-04Catadioptric projection objective
#60 | 2008-08-28Illumination system or projection lens of a microlithographic exposure system
#61 | 2008-08-21Projection objective, projection exposure apparatus and reflective reticle for microlithography
#62 | 2008-08-14Illumination system for a microlithgraphic exposure apparatus
#63 | 2008-08-07Catadioptric projection objective
#64 | 2008-07-24Projection objective for lithography
#65 | 2008-07-17Optical System of a Microlithographic Projection Exposure Apparatus
#66 | 2008-06-26CATADIOPTRIC PROJECTION OBJECTIVE
#67 | 2008-06-26CATADIOPTRIC PROJECTION OBJECTIVE
#68 | 2008-06-26MULTIPLE-USE PROJECTION SYSTEM
#69 | 2008-02-14Projection objective and projection exposure apparatus including the same
#70 | 2007-12-13Catadioptric imaging system with beam splitter
#71 | 2007-10-11Catadioptric projection objective
#72 | 2005-09-01Catadioptric projection objective
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