Tsukuba
Japan
11
2019-01-24
The entities that hold a legal rights for patent applications filed by inventor Ko Changhee:
Changhee Ko from Tsukuba, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
VAPOR DISPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES
#2 | 2017-06-29VAPOR DEPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES
#3 | 2016-05-19Titanium-containing film forming compositions for vapor deposition of titanium-containing films
#4 | 2016-04-21Vapor deposition of silicon-containing films using penta-substituted disilanes
#5 | 2016-02-11BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS
#6 | 2016-02-04BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)TUNGSTEN MOLECULES FOR DEPOSITION OF TUNGSTEN-CONTAINING FILMS
#7 | 2016-01-14Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
#8 | 2016-01-07BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS
#9 | 2015-12-24Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
#10 | 2013-11-07Titanium-aluminum alloy deposition with titanium-tetrahydroaluminate bimetallic molecules
#11 | 2012-07-12Deposition of group IV metal-containing films at high temperature
518375 ⎘