Jena
Germany
8
2025-06-26
The entities that hold a legal rights for patent applications filed by inventor Decker Manuel:
Manuel Decker from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM
#2 | 2025-02-06MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIER ELEMENT FOR USE IN A MASK INSPECTION DEVICE
#3 | 2024-11-07OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM
#4 | 2024-11-07OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM
#5 | 2024-10-31METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM DURING THE ILLUMINATION AND IMAGING OF AN OBJECT BY MEANS OF AN OPTICAL MEASUREMENT SYSTEM
#6 | 2022-12-01METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN ILLUMINATED BY ILLUMINATION LIGHT WITHIN AN ENTRANCE PUPIL TO BE MEASURED
#7 | 2022-06-23Diffractive optical element, method for designing an efficiency-achromatized diffractive structure, and method for producing an efficiency-achromatized diffractive element
#8 | 2021-09-09SPECTACLE LENS HAVING A DIFFRACTION STRUCTURE FOR LIGHT
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