Fremont, California
United States
12
2026-05-21
The entities that hold a legal rights for patent applications filed by inventor XUE Jun:
Jun XUE from Fremont, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SELECTIVELY ETCHING FOR NANOWIRES
#2 | 2026-02-05INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER
#3 | 2025-10-23UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
#4 | 2025-09-18INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER
#5 | 2025-07-31ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
#6 | 2025-02-20ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
#7 | 2024-11-28HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
#8 | 2024-08-01UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
#9 | 2023-07-20SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
#10 | 2022-09-08HIGH DENSITY, MODULUS, AND HARDNESS AMORPHOUS CARBON FILMS AT LOW PRESSURE
#11 | 2022-06-09High etch selectivity, low stress ashable carbon hard mask
#12 | 2021-10-28Selectively etching for nanowires
5228809 ⎘