Inventor profile of:

Ta-Cheng LIEN

City:

Hsinchu

Country:

Taiwan

Published Applications:

36

Last publication date:

2026-05-07

Top Assignees for applications by Ta-Cheng LIEN

The entities that hold a legal rights for patent applications filed by inventor LIEN Ta-Cheng:

Recent patent applications by LIEN Ta-Cheng

Ta-Cheng LIEN from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-07
US20260126729A1
Physics

INTERSTITIAL TYPE ABSORBER FOR EXTREME ULTRAVIOLET MASK

#2 | 2026-05-07
US20260126716A1
Physics

EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS

#3 | 2025-11-27
US20250362588A1
Physics

RETICLE CONTAINER

#4 | 2025-11-27
US20250362580A1
Physics

EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER

#5 | 2025-11-20
US20250355360A1
Physics

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

#6 | 2025-10-16
US20250321477A1
Physics

LITHOGRAPHY MASK AND METHODS

#7 | 2025-10-16
US20250321476A1
Physics

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

#8 | 2025-10-09
US20250314956A1
Physics

REFLECTIVE MASKS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE

#9 | 2025-10-02
US20250306450A1
Physics

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

#10 | 2025-09-25
US20250298305A1
Physics

REFLECTIVE MASK AND METHOD OF MAKING SEMICONDUCTOR DEVICE

#11 | 2025-09-25
US20250298304A1
Physics

REFLECTIVE MASK AND METHOD OF MAKING SEMICONDUCTOR DEVICE

#12 | 2025-06-05
US20250180983A1
Physics

CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR

#13 | 2025-02-27
US20250068060A1
Physics

METHOD OF FABRICATING AND SERVICING A PHOTOMASK

#14 | 2024-11-28
US20240393674A1
Physics

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MATERIAL

#15 | 2024-11-07
US20240369918A1
Physics

METHOD OF MANUFACTURING EUV PHOTO MASKS

#16 | 2024-10-10
US20240337917A1
Physics

METHODS OF MAKING A SEMICONDUCTOR DEVICE

#17 | 2024-09-12
US20240302731A1
Physics

REFLECTIVE MASK

#18 | 2024-06-13
US20240192581A1
Physics

Extreme ultraviolet mask with tantalum base alloy absorber

#19 | 2023-12-21
US20230408906A1
Physics

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

#20 | 2023-11-23
US20230375921A1
Physics

EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS

#21 | 2023-11-23
US20230375911A1
Physics

EUV mask blank and method of making EUV mask blank

#22 | 2023-11-16
US20230367193A1
Physics

Method of manufacturing EUV photo masks

#23 | 2023-11-02
US20230350283A1
Physics

EUV photo masks and manufacturing method thereof

#24 | 2023-05-25
US20230161261A1
Physics

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

#25 | 2023-05-25
US20230161241A1
Physics

EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER

#26 | 2023-03-23
US20230085685A1
Physics

EUV photo masks and manufacturing method thereof

#27 | 2023-01-19
US20230013260A1
Physics

INTERSTITIAL TYPE ABSORBER FOR EXTREME ULTRAVIOLET MASK

#28 | 2022-12-08
US20220390827A1
Physics

LITHOGRAPHY MASK AND METHODS

#29 | 2022-12-01
US20220382148A1
Physics

Extreme ultraviolet mask with alloy based absorbers

#30 | 2022-10-27
US20220342292A1
Physics

EUV mask blank and method of making EUV mask blank

#31 | 2022-08-18
US20220260932A1
Physics

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

#32 | 2022-08-04
US20220244634A1
Physics

Network type pellicle membrane and method for forming the same

#33 | 2022-07-14
US20220221785A1
Physics

Mask for extreme ultraviolet photolithography

#34 | 2022-05-05
US20220137499A1
Physics

Extreme ultraviolet mask with tantalum base alloy absorber

#35 | 2022-04-21
US20220121101A1
Physics

Methods for forming extreme ultraviolet mask comprising magnetic material

#36 | 2021-11-04
US20210341829A1
Physics

Mask for extreme ultraviolet photolithography

InventorID:

5233288 ⎘