Hsinchu
Taiwan
60
2026-05-28
The entities that hold a legal rights for patent applications filed by inventor Lo Ting-Ya:
Ting-Ya Lo from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
SEMICONDUCTOR DEVICE STRUCTURE WITH INTERCONNECT STRUCTURE HAVING AIR GAP
#2 | 2026-05-21SEMICONDUCTOR DEVICE WITH AIR GAP AND MANUFACTURING METHOD THEREOF
#3 | 2026-04-16SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
#4 | 2026-04-16INTERCONNECTION STRUCTURE, AND METHOD FOR FABRICATING THE SAME
#5 | 2026-04-02INTERCONNECT STRUCTURE HAVING METAL FEATURES WITH DIFFERENT VOLUME AND MATERIALS, AND METHOD FOR MANUFACTURING THE SAME
#6 | 2026-03-05SEMICONDUCTOR STRUCTURE HAVING METAL-ORGANIC FRAMEWORK MATERIAL AND METHOD OF MANUFACTURING THE SAME
#7 | 2026-02-26SEMICONDUCTOR DEVICE INCLUDING INTERCONNECT STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
#8 | 2026-01-22SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
#9 | 2025-11-27SEMICONDUCTOR INTERCONNECTION STRUCTURE AND METHODS OF FORMING THE SAME
#10 | 2025-11-20SEMICONDUCTOR DEVICE HAVING METALLIZATION LAYER WITH LOW CAPACITANCE AND METHOD FOR MANUFACTURING THE SAME
#11 | 2025-11-20INTERCONNECT STRUCTURE WITH HIGH THERMAL CONDUCTIVITY AND LOW PARASITIC CAPACITANCE
#12 | 2025-11-20INTERCONNECT STRUCTURE WITH LOW CAPACITANCE AND HIGH THERMAL CONDUCTIVITY
#13 | 2025-10-30SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
#14 | 2025-10-23INTEGRATED CIRCUIT DEVICE INCLUDING A HIGH THERMAL CONDUCTIVITY ELECTRICALLY INSULATING STRUCTURE
#15 | 2025-10-16SEMICONDUCTOR DEVICE STRUCTURE HAVING AIR GAP AND METHODS OF FORMING THE SAME
#16 | 2025-06-26ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF
#17 | 2025-05-22SEMICONDUCTOR DEVICE HAVING LOW DIELECTRIC CAPACITANCE, AND METHOD FOR MANUFACTURING THE SAME
#18 | 2025-05-08INTERCONNECT STRUCTURE WITH LOW RC DELAY AND METHOD FOR MANUFACTURING THE SAME
#19 | 2025-05-01INTERCONNECT STRUCTURE WITH HIGH THERMAL CONDUCTIVITY AND LOW PARASITIC CAPACITANCE
#20 | 2025-04-24INTERCONNECTION STRUCTURE
#21 | 2025-04-17INTEGRATED CIRCUIT DEVICE INCLUDING A HIGH THERMAL CONDUCTIVITY ELECTRICALLY INSULATING STRUCTURE
#22 | 2025-04-10INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THEREOF
#23 | 2025-04-10INTERCONNECT STRUCTURE WITH LOW CAPACITANCE AND HIGH THERMAL CONDUCTIVITY
#24 | 2025-04-10SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
#25 | 2025-03-20INTERCONNECT STRUCTURE AND METHODS OF FORMING THE SAME
#26 | 2025-02-06THERMAL INTERCONNECT STRUCTURE FOR THERMAL MANAGEMENT OF ELECTRICAL INTERCONNECT STRUCTURE
#27 | 2024-11-14SEMICONDUCTOR STRUCTURE HAVING SELF-ALIGNED CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SEMICONDUCTOR STRUCTURE
#28 | 2024-11-14SEMICONDUCTOR DEVICE HAVING THERMALLY CONDUCTIVE AIR GAP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
#29 | 2024-11-14INTERCONNECT STRUCTURE AND METHODS OF FORMING THE SAME
#30 | 2024-11-07SEMICONDUCTOR INTERCONNECTION STRUCTURE AND METHODS OF FORMING THE SAME
#31 | 2024-10-31SEMICONDUCTOR DEVICE HAVING METALLIZATION LAYER WITH LOW CAPACITANCE AND METHOD FOR MANUFACTURING THE SAME
#32 | 2024-10-17SEMICONDUCTOR DEVICES WITH AIR GATE SPACER AND AIR GATE CAP
#33 | 2024-10-17SEMICONDUCTOR DEVICE STRUCTURE WITH INTERCONNECT STRUCTURE HAVING AIR GAP
#34 | 2024-09-19SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
#35 | 2024-09-12BARRIER & AIR-GAP SCHEME FOR HIGH PERFORMANCE INTERCONNECTS
#36 | 2024-07-11SEMICONDUCTOR DEVICE HAVING LOW DIELECTRIC CAPACITANCE AND GOOD ELECTRICAL BREAKDOWN PERFORMANCE, AND METHOD FOR MANUFACTURING THE SAME
#37 | 2024-05-16SEMICONDUCTOR STRUCTURE HAVING AIR GAPS AND METHOD FOR MANUFACTURING THE SAME
#38 | 2024-03-14SEMICONDUCTOR INTERCONNECTION STRUCTURE AND METHODS OF FORMING THE SAME
#39 | 2023-11-30Semiconductor device structure having air gap and methods of forming the same
#40 | 2023-08-17Semiconductor device having metallization layer with low capacitance and method for manufacturing the same
#41 | 2023-08-10Thermal interconnect structure for thermal management of electrical interconnect structure
#42 | 2023-06-08SEMICONDUCTOR INTERCONNECTION STRUCTURES AND METHODS OF FORMING THE SAME
#43 | 2023-05-18INTERCONNECTION STRUCTURE AND METHODS OF FORMING THE SAME
#44 | 2023-05-18Semiconductor device structure and methods of forming the same
#45 | 2023-03-02Barrier and air-gap scheme for high performance interconnects
#46 | 2023-03-02Semiconductor structure having air gaps and method for manufacturing the same
#47 | 2023-03-02Interconnect structure and methods of forming the same
#48 | 2023-03-02Method for manufacturing semiconductor device having low-k carbon-containing dielectric layer
#49 | 2023-03-02SEMICONDUCTOR DEVICE HAVING THERMALLY CONDUCTIVE AIR GAP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
#50 | 2023-03-02SEMICONDUCTOR STRUCTURE HAVING SELF-ALIGNED CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SEMICONDUCTOR STRUCTURE
#51 | 2023-03-02SEMICONDUCTOR DEVICE STRUCTURE HAVING AIR GAP AND METHODS OF FORMING THE SAME
#52 | 2023-01-19Semiconductor device structure with interconnect structure having air gap
#53 | 2022-11-10INTERCONNECT STRUCTURE
#54 | 2022-10-06Semiconductor interconnection structure and methods of forming the same
#55 | 2022-09-08Semiconductor interconnection structure and methods of forming the same
#56 | 2022-07-28Semiconductor devices with air gate spacer and air gate cap
#57 | 2022-07-14Semiconductor device structure and methods of forming the same
#58 | 2022-05-19Interconnect structure
#59 | 2022-05-19Thermal interconnect structure for thermal management of electrical interconnect structure
#60 | 2021-12-02Semiconductor devices with air gate spacer and air gate cap
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