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Inventor profile of:

Vincent M. Omarjee

City:

Grenoble

Country:

France

Published Applications:

Last publication date:

2019-10-24

Top Assignees for applications by Vincent M. Omarjee

The entities that hold a legal rights for patent applications filed by inventor Omarjee Vincent M.:

American Air Liquide, Inc. 13 Fremont, CA United States
L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude 3 Paris, France
Air Liquide Electronics U.S. LP 2 Dallas, TX United States
American Air Liquide, Inc. 1 Houston, TX United States
American Air Liquide, Inc. 1 Freemont, CA United States
L'Air Liquide SocieteAnonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude 1 Paris, France

Recent patent applications by Omarjee Vincent M.

Vincent M. Omarjee from Grenoble, FR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-10-24

US20190326129A1

Electricity

Fluorocarbon molecules for high aspect ratio oxide etch

#2 | 2017-06-22

US20170178923A1

Electricity

Iodine-containing compounds for etching semiconductor structures

#3 | 2017-04-13

US20170103901A1

Electricity

Chemistries for TSV/MEMS/power device etching

#4 | 2017-02-02

US20170032976A1

Electricity

Fluorocarbon molecules for high aspect ratio oxide etch

#5 | 2013-08-08

US20130202794A1

Chemistry; metallurgy

METAL FILM DEPOSITION

#6 | 2013-05-02

US20130109198A1

Electricity

HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION

#7 | 2013-04-11

US20130089681A1

Chemistry; metallurgy

PLASMA-ENHANCED DEPOSITION OF TITANIUM-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE TITANIUM PRECURSORS

#8 | 2013-04-11

US20130089679A1

Chemistry; metallurgy

PLASMA-ENHANCED DEPOSITION OF MANGANESE-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE MANGANESE PRECURSORS

#9 | 2013-04-11

US20130089678A1

Chemistry; metallurgy

PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE NICKEL PRECURSORS

#10 | 2013-01-24

US20130022745A1

Electricity

SILANE BLEND FOR THIN FILM VAPOR DEPOSITION

#11 | 2012-12-20

US20120321817A1

Chemistry; metallurgy

Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof

#12 | 2012-09-13

US20120227762A1

Electricity

PLASMA ASHING COMPOUNDS AND METHODS OF USE

#13 | 2012-08-16

US20120207928A1

Electricity

Methods of making and deposition methods using hafnium- or zirconium-containing compounds

#14 | 2012-08-16

US20120207927A1

Chemistry; metallurgy

Hafnium- and zirconium-containing precursors and methods of using the same

InventorID:

52810 ⎘