Christopher John Ellison

City:

Austin, Texas

Country:

United States

Published Applications:

Last publication date:

2017-08-24

Top Assignees for applications by Christopher John Ellison

The entities that hold a legal rights for patent applications filed by inventor Ellison Christopher John:

Board of Regents, The University of Texas System 8 Austin, TX United States
National University of Sinapore 1 Singapore, Singapore

Recent patent applications by Ellison Christopher John

Christopher John Ellison from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-08-24

US20170240681A1

Chemistry; metallurgy

Block polymers for sub-10 nm patterning

#2 | 2015-12-24

US20150370159A1

Physics

Anhydride copolymer top coats for orientation control of thin film block copolymers

#3 | 2015-08-20

US20150232689A1

Chemistry; metallurgy

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

#4 | 2013-12-26

US20130344242A1

Chemistry; metallurgy

Anhydride copolymer top coats for orientation control of thin film block copolymers

#5 | 2013-10-24

US20130280497A1

Chemistry; metallurgy

Anhydride copolymer top coats for orientation control of thin film block copolymers

#6 | 2013-10-10

US20130266780A1

Performing operations; transporting

Polylactide/silicon-containing block copolymers for nanolithography

#7 | 2013-08-15

US20130209757A1

Chemistry; metallurgy

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

#8 | 2013-08-01

US20130196019A1

Performing operations; transporting

SILICON-CONTAINING BLOCK CO-POLYMERS, METHODS FOR SYNTHESIS AND USE

#9 | 2013-02-21

US20130045361A1

Chemistry; metallurgy

Surface treatments for alignment of block copolymers

#10 | 2013-01-24

US20130022785A1

Chemistry; metallurgy

OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS

InventorID:

52898 ⎘