Jyoetsu
Japan
27
2018-01-11
The entities that hold a legal rights for patent applications filed by inventor WATANABE Takeru:
Takeru WATANABE from Jyoetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
#2 | 2017-12-28Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound
#3 | 2017-06-29Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
#4 | 2017-06-29Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
#5 | 2016-12-08Resist under layer film composition and patterning process
#6 | 2016-09-29Polymer for resist under layer film composition, resist under layer film composition, and patterning process
#7 | 2016-08-11Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
#8 | 2016-08-11Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process
#9 | 2016-01-28Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#10 | 2016-01-21Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#11 | 2015-12-10Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process
#12 | 2013-12-19Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#13 | 2013-11-14Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
#14 | 2012-07-19Resist underlayer film composition and patterning process using the same
#15 | 2012-07-19Resist composition and patterning process
#16 | 2012-07-19Resist composition and patterning process
#17 | 2012-07-05Resist underlayer film composition and patterning process using the same
#18 | 2012-06-07Resist underlayer film composition and patterning process using the same
#19 | 2012-05-03Resist underlayer film composition and patterning process using the same
#20 | 2012-02-23Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative
#21 | 2011-12-15RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS
#22 | 2011-08-11Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
#23 | 2011-07-21Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
#24 | 2010-09-16Method for producing molecule immobilizing substrate, and molecule immobilizing substrate
#25 | 2010-05-13Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
#26 | 2010-01-14Resist composition and patterning process
#27 | 2009-12-03Polymerizable compound, polymer, positive resist composition, and patterning process using the same
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