Newark, California
United States
25
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor Li Da:
Da Li from Newark, US has applied for patents for these inventions. The list has both pending applications and granted patents:
CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP DETERRENCE
#2 | 2026-03-12PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#3 | 2026-02-05INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER
#4 | 2025-10-23UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
#5 | 2025-09-18INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER
#6 | 2025-07-31ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
#7 | 2025-03-20REWORK OF METAL-CONTAINING PHOTORESIST
#8 | 2025-02-20ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
#9 | 2024-12-26ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTRAVIOLET LITHOGRAPHY RESIST IMPROVEMENT
#10 | 2024-12-19PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#11 | 2024-10-31PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
#12 | 2024-10-03MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFORMANCE OF METAL-CONTAINING RESIST
#13 | 2024-10-03CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP DETERRENCE
#14 | 2024-08-01UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
#15 | 2024-06-13APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE INFUSION OF A SENSITIZER
#16 | 2024-02-01CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
#17 | 2023-10-05DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST
#18 | 2023-07-20SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
#19 | 2023-02-02POST APPLICATION/EXPOSURE TREATMENTS TO IMPROVE DRY DEVELOPMENT PERFORMANCE OF METAL-CONTAINING EUV RESIST
#20 | 2022-10-27DRY CHAMBER CLEAN OF PHOTORESIST FILMS
#21 | 2022-08-04Photoresist development with halide chemistries
#22 | 2022-07-07Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement
#23 | 2022-04-21Selective etch using a sacrificial mask
#24 | 2022-02-10Underlayer for photoresist adhesion and dose reduction
#25 | 2022-02-03Underlayer for photoresist adhesion and dose reduction
5315642 ⎘