Albany, California
United States
129
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Marakhtanov Alexei:
Alexei Marakhtanov from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
MINIMIZING REFLECTED POWER IN A TUNABLE EDGE SHEATH SYSTEM
#2 | 2026-04-09PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD
#3 | 2026-03-19TAPERED UPPER ELECTRODE FOR UNIFORMITY CONTROL IN PLASMA PROCESSING
#4 | 2026-02-12Radiofrequency Signal Filter Arrangement for Plasma Processing System
#5 | 2025-11-27Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
#6 | 2025-10-09ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING
#7 | 2025-08-28SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LOW FREQUENCY CYCLE
#8 | 2025-08-07Systems and Methods for Use of Low Frequency Harmonics in Bias Radiofrequency Supply to Control Uniformity of Plasma Process Results Across Substrate
#9 | 2025-06-12Process Control for Ion Energy Delivery Using Multiple Generators and Phase Control
#10 | 2025-05-01SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER ASSOCIATED WITH AN HF RF GENERATOR EFFICIENTLY
#11 | 2025-03-13TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SHEATH SYSTEM
#12 | 2025-02-13Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System
#13 | 2025-01-02EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
#14 | 2024-11-28IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
#15 | 2024-08-08RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
#16 | 2024-07-11MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE
#17 | 2024-06-06SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE OF A PLASMA CHAMBER
#18 | 2024-05-16RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
#19 | 2023-10-05Systems and methods for use of low frequency harmonics in bias radiofrequency supply to control uniformity of plasma process results across substrate
#20 | 2023-10-05PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION
#21 | 2023-09-21PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD
#22 | 2023-09-21Systems and methods for extracting process control information from radiofrequency supply system of plasma processing system
#23 | 2023-08-10Systems and Methods for Radiofrequency Signal Generator-Based Control of Impedance Matching System
#24 | 2023-07-20Process control for ion energy delivery using multiple generators and phase control
#25 | 2023-07-13PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD
#26 | 2023-03-30MINIMIZING REFLECTED POWER IN A TUNABLE EDGE SHEATH SYSTEM
#27 | 2023-03-23Tuning voltage setpoint in a pulsed RF signal for a tunable edge sheath system
#28 | 2023-03-16Impedance match with an elongated RF strap
#29 | 2023-03-09ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING
#30 | 2023-02-23Optimization of Radiofrequency Signal Ground Return in Plasma Processing System
#31 | 2023-02-23Radiofrequency Signal Filter Arrangement for Plasma Processing System
#32 | 2023-01-12Systems and methods for using binning to increase power during a low frequency cycle
#33 | 2022-08-11Systems and methods for cleaning an edge ring pocket
#34 | 2022-06-23Systems and methods for optimizing power delivery to an electrode of a plasma chamber
#35 | 2022-01-06High speed synchronization of plasma source/bias power delivery
#36 | 2021-10-14Systems and methods for optimizing power delivery to an electrode of a plasma chamber
#37 | 2021-09-23Electrostatic Chuck design for cooling-gas light-up prevention
#38 | 2020-12-31High speed synchronization of plasma source/bias power delivery
#39 | 2020-11-19Ring Structures and Systems for Use in a Plasma Chamber
#40 | 2020-07-30Multi zone gas injection upper electrode system
#41 | 2020-07-16Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#42 | 2020-07-16Pulsed plasma chamber in dual chamber configuration
#43 | 2020-04-02Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
#44 | 2020-03-19Three or more states for achieving high aspect ratio dielectric etch
#45 | 2019-12-19Active control of radial etch uniformity
#46 | 2019-12-10Three or more states for achieving high aspect ratio dielectric etch
#47 | 2019-10-17CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH
#48 | 2019-08-08TAPERED UPPER ELECTRODE FOR UNIFORMITY CONTROL IN PLASMA PROCESSING
#49 | 2019-08-08Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
#50 | 2019-03-14Multi regime plasma wafer processing to increase directionality of ions
#51 | 2019-02-21Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#52 | 2019-01-03Electrostatic chuck design for cooling-gas light-up prevention
#53 | 2018-10-18Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
#54 | 2018-06-19Multi regime plasma wafer processing to increase directionality of ions
#55 | 2018-06-14Multi-radiofrequency impedance control for plasma uniformity tuning
#56 | 2018-03-22Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#57 | 2018-01-25Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
#58 | 2018-01-11Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
#59 | 2018-01-04ION TO NEUTRAL CONTROL FOR WAFER PROCESSING WITH DUAL PLASMA SOURCE REACTOR
#60 | 2018-01-04Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
#61 | 2017-12-28Uniformity control circuit for use within an impedance matching circuit
#62 | 2017-12-26Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#63 | 2017-07-27Ion to neutral control for wafer processing with dual plasma source reactor
#64 | 2017-07-27MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER
#65 | 2017-06-08Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
#66 | 2017-04-20Electrostatic chuck design for cooling-gas light-up prevention
#67 | 2017-04-13Uniformity control circuit for use within an impedance matching circuit
#68 | 2017-03-23Ion energy control by RF pulse shape
#69 | 2016-10-20Control of impedance of RF delivery path
#70 | 2016-10-20Systems and methods for controlling a plasma edge region
#71 | 2016-09-08Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
#72 | 2016-08-11Control of impedance of RF return path
#73 | 2016-06-16Ion energy control by RF pulse shape
#74 | 2016-06-02Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
#75 | 2016-05-26Pulsed plasma chamber in dual chamber configuration
#76 | 2016-03-17Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
#77 | 2016-02-18MOVABLE GROUND RING FOR MOVABLE SUBSTRATE SUPPORT ASSEMBLY OF A PLASMA PROCESSING CHAMBER
#78 | 2015-12-10Negative ion control for dielectric etch
#79 | 2015-04-02Control of impedance of RF delivery path
#80 | 2015-04-02Control of impedance of RF return path
#81 | 2015-03-26Ion to neutral control for wafer processing with dual plasma source reactor
#82 | 2015-02-26Methods for Selectively Modifying RF Current Paths in a Plasma Processing System
#83 | 2015-01-01Plasma processing chamber with dual axial gas injection and exhaust
#84 | 2014-07-10Control of etch rate using modeling, feedback and impedance match
#85 | 2014-02-06APPARATUS FOR PLASMA PROCESSING SYSTEM WITH TUNABLE CAPACITANCE
#86 | 2013-12-12Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system
#87 | 2013-10-03Multi-radiofrequency impedance control for plasma uniformity tuning
#88 | 2013-09-19Methods and apparatus for selectively modifying RF current paths in a plasma processing system
#89 | 2013-09-19METHODS AND APPARATUS FOR SELECTIVELY MODULATING AZIMUTHAL NON-UNIFORMITY IN A PLASMA PROCESSING SYSTEM
#90 | 2013-08-15ARRANGEMENTS FOR CONTROLLING PLASMA PROCESSING PARAMETERS
#91 | 2013-05-30Movable grounding arrangements in a plasma processing chamber and methods therefor
#92 | 2013-05-30Gas feed insert in a plasma processing chamber and methods therefor
#93 | 2013-05-23Systems and methods for controlling a plasma edge region
#94 | 2013-05-23Triode reactor design with multiple radiofrequency powers
#95 | 2013-03-07Pulsed Plasma Chamber in Dual Chamber Configuration
#96 | 2013-01-24Negative ion control for dielectric etch
#97 | 2012-12-13Plasma-enhanced substrate processing method and apparatus
#98 | 2012-12-13Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate
#99 | 2012-06-28Showerhead electrodes
#100 | 2012-01-05Movable ground ring for a plasma processing chamber
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