Inventor profile of:

Daniel PETER

City:

Sunnyvale, California

Country:

United States

Published Applications:

17

Last publication date:

2026-05-21

Top Assignees for applications by Daniel PETER

The entities that hold a legal rights for patent applications filed by inventor PETER Daniel:

Recent patent applications by PETER Daniel

Daniel PETER from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-21
US20260143981A1
Electricity

SELECTIVELY ETCHING FOR NANOWIRES

#2 | 2026-04-16
US20260106122A1
Electricity

DRY CHAMBER CLEAN USING THERMAL AND PLASMA PROCESSES

#3 | 2026-03-12
US20260072349A1
Physics

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

#4 | 2026-02-05
US20260036908A1
Physics

INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER

#5 | 2025-09-18
US20250291255A1
Physics

INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER

#6 | 2025-03-20
US20250093781A1
Physics

REWORK OF METAL-CONTAINING PHOTORESIST

#7 | 2024-12-19
US20240419078A1
Physics

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

#8 | 2024-10-31
US20240361696A1
Physics

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

#9 | 2024-10-24
US20240355650A1
Electricity

DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEVELOPMENT BYPRODUCTS IN WAFERS

#10 | 2024-02-01
US20240036474A1
Physics

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

#11 | 2023-10-05
US20230314954A1
Physics

DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST

#12 | 2023-04-20
US20230118701A1
Electricity

SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING HARDMASK

#13 | 2023-02-16
US20230047486A1
Electricity

ALLOY FILM ETCH

#14 | 2022-10-27
US20220344136A1
Electricity

DRY CHAMBER CLEAN OF PHOTORESIST FILMS

#15 | 2022-08-04
US20220244645A1
Physics

Photoresist development with halide chemistries

#16 | 2022-06-30
US20220208555A1
Electricity

Deposition of self assembled monolayer for enabling selective deposition and etch

#17 | 2022-04-21
US20220122848A1
Electricity

Selective etch using a sacrificial mask

InventorID:

5384546 ⎘