Boise, Idaho
United States
8
2014-01-09
The entities that hold a legal rights for patent applications filed by inventor deVilliers Anton J.:
Anton J. deVilliers from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Methods of forming a pattern on a substrate
#2 | 2013-11-21Methods for forming resist features and arrays of aligned, elongate resist features
#3 | 2013-02-14Methods of processing substrates
#4 | 2013-01-03Methods of forming patterned masks
#5 | 2012-11-08Methods of forming a pattern on a substrate
#6 | 2012-07-12Imaging devices, methods of forming same, and methods of forming semiconductor device structures
#7 | 2012-07-12Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same
#8 | 2011-03-03Methods of forming a reversed pattern in a substrate
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