Beaverton, Oregon
United States
15
2026-05-28
The entities that hold a legal rights for patent applications filed by inventor KUMAR Ravi:
Ravi KUMAR from Beaverton, US has applied for patents for these inventions. The list has both pending applications and granted patents:
INHIBITED ATOMIC LAYER DEPOSITION FOR PATTERNING APPLICATIONS
#2 | 2026-03-19LAYERED METAL OXIDE-SILICON OXIDE FILMS
#3 | 2026-02-26PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
#4 | 2025-11-06NONCONFORMAL OXIDE FILM DEPOSITION USING CARBON-CONTAINING INHIBITOR
#5 | 2025-09-04RAPID TUNING OF CRITICAL DIMENSION NON-UNIFORMITY BY MODULATING TEMPERATURE TRANSIENTS OF MULTI-ZONE SUBSTRATE SUPPORTS
#6 | 2025-04-17SUBSTRATE PROCESSING APARATUSES WITH ROTATING MECHANISMS INCLUDING SHAFTS WITH GAS FLOW PATHS
#7 | 2024-11-28TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRATE SUPPORT FOR MULTI-PATTERNING PROCESSES
#8 | 2024-10-03PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
#9 | 2023-06-01AUTOMATED FEEDFORWARD AND FEEDBACK SEQUENCE FOR PATTERNING CD CONTROL
#10 | 2023-01-05PRESSURE BATCH COMPENSATION TO STABILIZE CD VARIATION FOR TRIM AND DEPOSITION PROCESSES
#11 | 2022-09-29Use of vacuum during transfer of substrates
#12 | 2022-08-04Temperature control of a multi-zone pedestal
#13 | 2022-08-04USE OF ROTATION TO CORRECT FOR AZIMUTHAL NON-UNIFORMITIES IN SEMICONDUCTOR SUBSTRATE PROCESSING
#14 | 2022-07-14Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports
#15 | 2022-06-30Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes
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